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Author

Evgeniy S. Shamin

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Research Article

Basic approaches to simulation of resist mask formation in computational lithography

Nikita N. Balan, Vladidmir V. Ivanov, Alexey V. Kuzovkov, Evgenia V. Sokolova, Evgeniy S. Shamin

10.3897/j.moem.6.1.55056

30-03-2020

Unique: 2297 | Total: 3553

Reprint: € 6,30

37-45

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