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Author

Evgenia V. Sokolova

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1 article by this author

Research Article

Basic approaches to simulation of resist mask formation in computational lithography

Nikita N. Balan, Vladidmir V. Ivanov, Alexey V. Kuzovkov, Evgenia V. Sokolova, Evgeniy S. Shamin

Part of: Physical characteristics and their study

10.3897/j.moem.6.1.55056

30-03-2020

Unique: 249 | Total: 343

Reprint: € 3,60

37-45

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