Basic approaches to simulation of resist mask formation in computational lithography


	Resist contour simulation: (a) model calibrated without SEM images; (b) calibrated with SEM images of contours for several test structures.

Part of: Balan NN, Ivanov VV, Kuzovkov AV, Sokolova EV, Shamin ES (2020) Basic approaches to simulation of resist mask formation in computational lithography. Modern Electronic Materials 6(1): 37-45. https://doi.org/10.3897/j.moem.6.1.55056