Basic approaches to simulation of resist mask formation in computational lithography


	Resist mask formation simulation examples: (a) 3D resist configuration computation using "full" simulation based on physical fundamentals (KLA Prolith CAD); (b) resist contour computation using compact models (Mentor Graphics Calibre CAD).

Part of: Balan NN, Ivanov VV, Kuzovkov AV, Sokolova EV, Shamin ES (2020) Basic approaches to simulation of resist mask formation in computational lithography. Modern Electronic Materials 6(1): 37-45. https://doi.org/10.3897/j.moem.6.1.55056