Regularities of microdefect formation in silicon during heat treatment for internal getter synthesis


	Diffraction contrast TEM image of precipitates in Si specimens: (a) dislocation loops diverging from a precipitate in Specimen 3; (b) dislocation loop around a particle in Specimen 2; (c) coherent particle in Specimen 4.

Part of: Bublik VT, Voronova MI, Shcherbachev KD, Mezhennyi MV, Reznik VYa (2019) Regularities of microdefect formation in silicon during heat treatment for internal getter synthesis. Modern Electronic Materials 5(3): 133-139. https://doi.org/10.3897/j.moem.5.52812