Other versions:

(Verbatim name)

ID

(Catalog Number)

ORG

DES

Invalid DOI was provided, please try again

XML
PDF
 
 
Bluesky
Twitter
Facebook
Telegram
Mendeley
Reddit
Notify a colleague
  • ContentsContents
  • Article InfoArticle Info
  • CiteCite
  • MetricsMetrics
  • CommentComment
  • RelatedRelated
  • FigsFigs
  • TabsTabs
  • RefsRefs
  • CitedCited
CrossRef
(4)
  • Beenaben S S, Gokul Jayavel, Srinivasan Manickam, Mariyappan Raman, Thiruvarasu Tamilarasu, Thi‐Hoai‐Thu Nguyen, Jyh‐Chen Chen (2026)
    Review on Oxygen Concentration in Czochralski Grown Silicon Crystals for Photovoltaic and Semiconductor Devices. Crystal Research and Technology 61: . CrossRef DOI: 10.1002/crat.70139
  • N. A. Verezub, A. I. Prostomolotov (2025)
    Role of Shield Around Crystal in Czochralski Process. Mechanics of Solids 60: 4414. CrossRef DOI: 10.1134/S0025654425602769
  • Qitao Zhang, Ai Wang, Junxian Chai, Tai Li, Peilin He, Xiang Zhou, Guoqiang Lv, Xingwei Yang, Wenhui Ma (2025)
    Argon-induced thermal field optimization and oxygen volatilization for vacancy-oxygen defect control in CZ silicon growth. Applied Thermal Engineering 281: 128610. CrossRef DOI: 10.1016/j.applthermaleng.2025.128610
  • Андрей Олегович Гусев (2025)
    Моделирование динамики температурного поля в нестационарном приближении при выращивании монокристаллов методом Чохральского. Computational Continuum Mechanics 18: 225. CrossRef DOI: 10.7242/1999-6691/2025.18.2.17
    • Subscribe to email alerts for current Article's categories
    Powered by